Profile

About

Hi I am Zhiya Dang. I am a research fellow, working as an experienced researcher in CATSENSE project at Nanoscale Physics Research Laboratory, at University of Birmingham. I am a highly self-motivated person with an aim to change the world with my research and make it a better place to live. I wish to improve the rural life with university education.

Previously, I worked as a research fellow at Singapore Synchrotron Light Source and Centre for Ion Beam Applications, NUS, Singapore. I graduated from Department of Physics, NUS with a doctorate thesis on the effect of ion beam irradiation on electrochemical etching of silicon, micro and nanofabrication of silicon, porous silicon, and glass, and its applications in photonic crystals.
Here is a brief summary of my main achievements during my PhD.
  1. Achievements in fabrication 
    • First to fabricate a large area free standing Si membrane of 50nm. (Link here) 
    • First to fabricate and characterize different kinds of photonic crystals using method of ion beam irradiation and selective electrochemical etching of Si. (Link here) 
  2. Discovered Underlying Physics Mechanism for Etching in Ion Irradiated Silicon 
    1. Our group at CIBA discovered funneling effect in charged particle irradiated doped semiconductors. (Link here)
    2. Explored the mechanism of etching of ion irradiated Si in great detail which led to different kinds of Si micro-machining techniques. 
    3. Came up with a theoretical formulation for core formation in ion-irradiated Silicon. 
Academic and Career Achievements

2005.09-2009.06 Bachelors in Physics, School of Physical Science and Technology, Lanzhou University, China
2009.08-2013.07 Doctor of Philosophy in Physics, NUS, Singapore
2013.08-2014.01 Research assistant,SSLS, NUS Singapore
2014.02-2014.10 Postdoc Researcher,SSLS, NUS, Singapore
2014.11-Present, Postdoc Experienced Researcher, Nanoscale Physics Research Laboratory, The University of Birmingham, United Kingdom

My current Research Interests
  • Nanoclusters 
  • Electron microscopy 
  • Ion beam based Micro and Nanofabrication, 
  • Ion beam modification of silicon, 
  • Selective electrochemical etching of silicon, 
  • Ion beam based fabrication of photonic devices such as photonic crystals, 
  • Fundamental studies such as 
    • Ion induced damage in silicon, 
    • Porous Silicon formation, 
    • Electrochemical etching of semiconductors
  • Voltage imaging using Ion induced charging on Liquid crystal device 









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